(Senior) Resist Modeling Engineer

This website uses cookies to ensure you get the best experience. Lace Lithography and our selected partners use cookies and similar technologies (together “cookies”) that are necessary to present this website, and to ensure you get the best experience of it. If you consent to it, we will also use cookies for analytics purposes. See our Cookie Policy to read more about the cookies we set. You can withdraw and manage your consent at any time, by clicking “Manage cookies” at the bottom of each website page. Accept all cookies Decline all non-necessary cookies Cookie preferences Select which cookies you accept On this site, we always set cookies that are strictly necessary, meaning they are necessary for the site to function properly. If you consent to it, we will also set other types of cookies. You can provide or withdraw your consent to the different types of cookies using the toggles below. You can change or withdraw your consent at any time, by clicking the link “Manage Cookies”, that is always available at the bottom of the site. To learn more about what the different types of cookies do, how your data is used when they are set etc, see our Cookie Policy. Strictly necessary These cookies are necessary to make the site work properly, and are always set when you visit the site. Vendors Teamtailor Analytics These cookies collect information to help us understand how the site is being used. Vendors Teamtailor Accept these cookies Decline all non-necessary cookies Skip to main content Career menu Employee Log in as employee Candidate Log in to Connect Homepage lacelithography.com Instrument Modelling · Barcelona Office (Senior) Resist Modeling Engineer Apply for this job We usually respond within three days We’re on a mission to do something really, really small. You’ll simulate the chemistry that brings our patterns to life.At Lace Lithography, we’re building a revolutionary chip lithography technology that will dramatically improve chip performance for decades to come. Founded in 2023, we’re based in Bergen (Norway) and Barcelona (Spain), and backed by some of the world’s most ambitious investors.Who Are We Looking ForYou will act as the vital bridge between our Resist Chemistry and Mask Optimization teams, ensuring our computational models match real-world process constraints. You thrive in a collaborative fast paced environment working on complex, interconnected, and evolving problems with a strong drive to learn new concepts.What you’ll doModel the aerial image-to-pattern transfer through the resist, accounting for stochastic effects predicting critical parameters like LER and LWR).Build a full resist simulation framework for a variety of resist materials, integrating resist activation physics into our resist-mask optimization framework.Develop and apply process-level or Monte Carlo simulation methods to predict resist performance and guide process window optimization.Work with our Bergen team and external collaborators to optimize resist behaviour and performance.Who you areMinimum QualificationsPhD or equivalent professional experience in Applied Physics, Chemical Engineering, Materials Science, or a related field with a strong focus on computational simulations.Strong knowledge in the fundamentals of photolithography, resist chemistry, and semiconductor processing.Proven expertise in process-level or Monte Carlo simulations.2+ years of industry or applied research experience in lithography or semiconductor process R&D.Desired qualificationsPrior experience in computational modeling of photoresist materials.Strong coding skills in Python/Julia frameworks.Experience collaborating closely with experimental/lab teams to derive semi-emperical models.Our team here at Lace…consists of amazing people...